Breakthrough EUV Dry Photoresist Technology from Lam Research Adopted by Leading Memory Manufacturer
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Breakthrough EUV Dry Photoresist Technology from Lam Research Adopted by Leading Memory Manufacturer


FREMONT, Calif., Jan. 29, 2025 /PRNewswire/ — Lam Research Corporation (Nasdaq: LRCX) today announced that Aether®, its innovative dry photoresist technology, has been selected by a leading memory manufacturer as production tool of record for the most advanced DRAM processes. A breakthrough introduced by Lam in 2020, dry resist extends the resolution, productivity, and yield of Extreme Ultraviolet (EUV) lithography, a pivotal technology used in the production of next-generation semiconductor devices.